Deprotection Reaction Analysis Device PAGA Series
We provide various devices for advanced evaluation of photoresists.
The Deprotection Reaction Analysis Device PAGA series features in-situ reaction analysis using PEB and 248mm exposure, as well as the capability to calculate deprotection reaction parameters. A bake plate is placed in the FT-IR chamber, allowing for the observation of functional group changes while heating. Additionally, it is equipped with a UV (248nm) irradiation device, which can also be used to analyze mechanisms of acid generation during exposure. For more details, please contact us or refer to the catalog.
- Company：リソテックジャパン
- Price：Other
